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Product research

Time

R&D Achievements

March 1998

The domestic first large area and high precision soda lime photomask was successfully developed

June 2002

The domestic first CF soda lime photomask was successfully developed

December 2002

The domestic first Liquid letterpress photomask was successfully developed

February 2005

The domestic first 3.5G CF quartz photomask was successfully developed

February 2006

The first set of 2.5G TFT photomask was successfully developed in China

October 2006

The first 3.5G TFT-CF large size photomask was successfully developed in China

March 2008

The first 5G TFT Array photomask was successfully developed in China

October 2009

The first G6 TFT Array photomask was successfully developed in China

June 2010

Succeeded in developing China’s first AMOLED photomask

February 2012

Succeeded in developing China’s first 800x960mm soda lime TP photomask

April 2014

Succeeded in developing the China’s first 8.5G TFT-LCD photomask

February 2015

Developed and produced China’s first 5.5G LTPS photomask

 

Equipment research and development

Time

R&D achievements

December 2003

The first large size high precision admeasuring apparatus was successfully self-developed in china

May 2006

The first LCVD repairing equipment, which is internationally advanced, was successfully developed in china

March 2006

The first large area photomask pellicle laminating machine was successfully developed in china

March 2007

The first large-area and high-precision photomask key CD measuring equipment was successfully developed in china

March 2009

The domestic first TFT LCD laser repairing machine was successfully developed

May 2010

China’s first PDP barrier repairing machine was successfully developed

October 2011

China’s first PDP barrier repairing machine was successfully identified by industry experts, which contributed to the localization of FPD equipment in China