TECHNICAL AREA
Product research
|
Time |
R&D Achievements |
|
March 1998 |
The domestic first large area and high precision soda lime photomask was successfully developed |
|
June 2002 |
The domestic first CF soda lime photomask was successfully developed |
|
December 2002 |
The domestic first Liquid letterpress photomask was successfully developed |
|
February 2005 |
The domestic first 3.5G CF quartz photomask was successfully developed |
|
February 2006 |
The first set of 2.5G TFT photomask was successfully developed in China |
|
October 2006 |
The first 3.5G TFT-CF large size photomask was successfully developed in China |
|
March 2008 |
The first 5G TFT Array photomask was successfully developed in China |
|
October 2009 |
The first G6 TFT Array photomask was successfully developed in China |
|
June 2010 |
Succeeded in developing China’s first AMOLED photomask |
|
February 2012 |
Succeeded in developing China’s first 800x960mm soda lime TP photomask |
|
April 2014 |
Succeeded in developing the China’s first 8.5G TFT-LCD photomask |
|
February 2015 |
Developed and produced China’s first 5.5G LTPS photomask |
Equipment research and development
|
Time |
R&D achievements |
|
December 2003 |
The first large size high precision admeasuring apparatus was successfully self-developed in china |
|
May 2006 |
The first LCVD repairing equipment, which is internationally advanced, was successfully developed in china |
|
March 2006 |
The first large area photomask pellicle laminating machine was successfully developed in china |
|
March 2007 |
The first large-area and high-precision photomask key CD measuring equipment was successfully developed in china |
|
March 2009 |
The domestic first TFT LCD laser repairing machine was successfully developed |
|
May 2010 |
China’s first PDP barrier repairing machine was successfully developed |
|
October 2011 |
China’s first PDP barrier repairing machine was successfully identified by industry experts, which contributed to the localization of FPD equipment in China |