Products

Technical achievements

 


Product R & D

Time R & D results
March 1998 The first large-area high-precision chrome mask in China
June 2002 The first color filter mask in China
February 2002 The first large-area quartz chrome mask in China
December 2005 The First Laser Beam Lithography Direct Writing Reticle Mask in China (0.5um IC Mask)
January 2006 The first large-area quartz mask for color liquid crystal display in China
March 2007 The first large-area chrome mask for OLED in China
August 2007 The first 5-generation TFT mask production line in China
March 2008 The first domestic mask for the 5th generation TFT
May 2010 The first domestic mask for 6-generation TFT
June 2010 The first domestic AMOLED mask version test version
April 2011 The first 8096 TP mask in China
January 2012 The first 4.5 generation AMOLED mask in China
April 2014 The first 8.5 generation TFT-LCD mask in China
February 2015 The first mask for 5.5 generation LTPS in China
October 2016 The first domestic mask for 6 generations of LTPS
September 2019 The first domestic mask for 6 generations of LTPS
October 2019 The first 8.6 generation GTM mask in China
March 2021 The first Lens Mura CD correction mask in China
March 2021 The first Mura full control mixed cutting panel mask in China
July 2023 China's First 6-Generation AMOLED High Precision Mask (980*1150)

 

 

Equipment R & D

Time R & D results
December 2003 The first high-precision long-size measuring instrument in China
May 2006 The first domestic LCVD equipment successfully developed
March 2007 The first domestic CD measuring machine, the first film machine
May 2010 The first PDP barrier repair machine in China
March 2011 The first domestic TFT panel repair equipment
May 2012 The first domestic TFT inspection equipment
December 2015 The first domestic LRCD1500 type LCVD repair machine
May 2018 The first 8.5 generation CD measuring machine in China
November 2018 The first 8.5 generation film sticking machine in China