Japan mask version workshop line
2016-11-18 09:46
At the invitation of the Mycronic, in early April this year, our company attended the 2016 mask seminar.
The conference was held at the Pacific Exhibition Center in Yokohama, Japan. This is the world's only large-area mask version of the technical seminar. About 150 relevant personnel from all over the world participated in the conference.
The meeting introduced the future development trend of TFT panel, PPI from 500PPI to 800PPI, panel resolution from 2um to 1um, CD from/-0.2um to/-0.1um, Overlay from/-0.65um to/-0.35um, and the corresponding Panel local flatness from 6um to 2um. And a number of technology development also came into being:
1. The new DUV exposure machine planned by Canon can replace the original I, G and H bands with DUV segments of <375nm, which can improve the seam resolution to 1.2um.
2. Mycronic introduced the P800 lithography machine. On the basis of the P80 lithography machine, the latest customized Final Lens is adopted, NA is increased by 25%, image field distortion is reduced by 3-5 times, Pixel Size is reduced by 20%, the minimum seam is reduced from 0.75um to 0.55um, and the original 9Beam drawing is increased to 15Beam, thus maintaining the same drawing speed as P80 on the basis of greatly improving resolution and CD uniformity.
3. The new i-line Pellicle and dry etching will also be applied to TFT masks to match DUV exposure machines and PSM to increase exposure DOF and improve CD uniformity.
4. The influence of Mask flatness on Panel exposure quality has been deeply studied. The Shimizu manager of Nikon Company introduced that poor flatness of the mask plate will cause exposure separation and affect CD. Cause deformation, affect position accuracy and overlay. The ultra-flat mask version was also born. The flatness of this mask version can reach 5um and 2um locally. However, it has not been found and proved that there is a measuring machine capable of measuring such a large area and high precision flatness!
5. In order to meet the requirements of high-end packaging, MEMS, LED and 3D molds, Mycronic also introduced FPS-X lithography machine, which is an upgraded version of FPS-5500. This machine reduces Pixel size(23%) and improves the graphics quality. At the same time, the 3Beam laser is increased to 5Beam, the scanning width is doubled, and the drawing speed is greatly improved.
The exhibition hall is located on the coast of Yokohama, with a beautiful environment and coinciding with the Japanese cherry blossom season!
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