Photomask is used in micro-electronic manufacturing, mainly including IC, (integrated circuit) chips, FPD (Flat-Panel Display), thin-film magnetic head and the PCB, etc. Photomask is similar like film to the photo. chip pattern is transferred by photomask from exposure process. after developer and etchant process, the design pattern is printed to the chip, the photo mask is also named reticle or mask.
Photomask is mainly used in:
FPD, like TFT-LCD, CF, CSTN-LCD, STN-LCD, TN-LCD, EL, OLED, PDP, VFD, etc.
Printed wiring board industry, like HDI, FPC, etc.
IC-related industries, for example, IC Bumping, IC substrates, lead frame, etc.
Precision electronic components industry, including MENS, SENSOR, ENODER, etc.